Rare Earth Sputtering Targets
Rare earth elements, also known as “industrial vitamin”, have excellent magnetic, optical, and electrical properties that cannot be replaced, that is why rare earth sputtering targets are used. Rare earth elements are widely used in high-tech fields such as metallurgy, military, aerospace, petrochemical, glass ceramics, etc. Rare earth sputtering targets (round targets, square targets, shaped targets), coating materials, cylinders, truncated cones, particles, flakes, powders, rods, ingots, etc., can be produced according to requirements. We have years of experience in making and handling rare-earth chemicals and sputter targets that are produced by these elements. We provide rare earth sputtering targets of high quality. The order quantity depends on customer demand, which fully meets the diverse needs of customers. We have a specialty in producing custom compositions for new propriety technologies and research and commercial applications. We can supply a full range of rare earth metal sputtering targets for your needs.
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Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST01LA44Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST01LA43Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST01LA42Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...NG0ST01LA26Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...NG0ST01LA25Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER16Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER15Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01ER14Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER13Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER12Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness:0.125''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness:0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER11Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER10Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER09Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST01CE018Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 3'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST01CE17Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST01CE017Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST01CE16Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE15Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE14Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE013Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE12Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE11Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE10Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE09Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE08Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE07Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE06Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE05Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE4Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE04Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE03Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CH02Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE01Qty in Cart: 0Quantity:Price:Subtotal: