Tungsten Titanium Sputtering Targets

Tungsten Titanium Sputtering Targets consist essentially of a continuous matrix of the Titanium-Tungsten (Ti-W) phase. They have high density and low impurity content. These targets possess advantages because of these two elements. The high atomic weight of Tungsten, the high level of corrosion resistance of Titanium, Titanium’s good adhesion to many different surfaces, and the insolubility of these elements combine to make these materials the ideal for thick and dense layers to restrain foreign atom diffusion. Because of this quality, W/Ti is used during the metallization process in microchips fabrication. Titanium Tungsten Sputtering Targets are also widely used for CD-ROM, semiconductors, LEDs, and decorations. They are also widely used in industries such as optical storage space industry, glass coating, optical communication, etc. The efficiency and effectiveness of the targets depend on the level of purity. We are specialized in producing supreme quality Titanium Tungsten Sputtering Targets with 99.9 % purity and in various forms.