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Rare Earth Sputtering Targets

Rare Earth Sputtering Targets

Rare earth elements, also known as “industrial vitamin”, have excellent magnetic, optical, and electrical properties that cannot be replaced, that is why rare earth sputtering targets are used. Rare earth elements are widely used in high-tech fields such as metallurgy, military, aerospace, petrochemical, glass ceramics, etc. Rare earth sputtering targets (round targets, square targets, shaped targets), coating materials, cylinders, truncated cones, particles, flakes, powders, rods, ingots, etc., can be produced according to requirements. We have years of experience in making and handling rare-earth chemicals and sputter targets that are produced by these elements. We provide rare earth sputtering targets of high quality. The order quantity depends on customer demand, which fully meets the diverse needs of customers. We have a specialty in producing custom compositions for new propriety technologies and research and commercial applications. We can supply a full range of rare earth metal sputtering targets for your needs.

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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA44
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA43
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA42
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  • Lanthanum Aluminate (indium)(LaAlO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST01LA26
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  • Lanthanum Aluminate (indium)(LaAlO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST01LA25
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER16
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER15
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01ER14
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER13
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER12
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness:0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness:0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER11
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER10
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER09
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE018
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE17
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE017
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE16
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE15
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE14
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:7'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE013
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:7'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE12
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:6'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE11
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  • Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE10
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:5'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE09
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:5'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE08
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99% Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE07
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE06
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE05
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE4
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE04
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE03
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CH02
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE01
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What are Graphene Nanoplatelets?

Graphene nanoplatelets (GNPs) are nanoscale particles made of multiple stacked layers of graphene, typically a few nanometers thick with diameters ranging from submicron to several microns. They deliver much of graphene's performance, including high electrical and thermal conductivity and excellent mechanical strength, while remaining easier to produce and more cost-effective for large-scale use. Their platelet shape and high aspect ratio make them especially valuable as additives, as explained in our overview of graphene nanoplatelet properties and applications.

Properties of Graphene Nanoplatelets

  • High electrical conductivity for conductive composites and coatings
  • Excellent thermal conductivity for heat dissipation and thermal management
  • High mechanical strength and stiffness for reinforcement
  • Large surface area and high aspect ratio
  • Chemical stability and barrier properties
  • Cost-effective and scalable for industrial use

Applications of Graphene Nanoplatelets

Graphene nanoplatelets are used across a wide range of industries, thanks to their balance of performance and cost. They reinforce polymer and composite materials, improve electrical and thermal conductivity in coatings and inks, and enhance electrode performance in batteries and supercapacitors. Their conductive network also supports EMI shielding, anti-static coatings, and thermal interface materials, and you can explore some of the best application areas of graphene nanoplatelets in more detail. The electrical properties of GNPs make them a practical choice wherever conductivity and mechanical strength are needed together.

Graphene Nanoplatelets vs Graphene Oxide

Graphene nanoplatelets and graphene oxide serve different needs. GNPs are conductive, hydrophobic, and ideal for reinforcement and thermal or electrical enhancement, while graphene oxide is oxygen-rich, water-dispersible, and better suited to functionalization and membranes. Our comparison of GNPs versus graphene oxide for composites can help you choose the right material for your formulation.

Graphene Nanoplatelets Price and Market

The global graphene nanoplatelets market continues to grow rapidly, driven by demand from composites, coatings, energy storage, and automotive sectors. Graphene nanoplatelet price varies depending on surface area, thickness, purity, and order volume, from research-scale grams to bulk industrial quantities. As a trusted graphene nanoplatelets supplier, Nanografi offers transparent, competitive pricing across a range of grades, so you can source the right material for your budget and application. Check the product listings above for up-to-date prices and specifications.

Frequently Asked Questions

Where can I buy graphene nanoplatelets?

You can buy graphene nanoplatelets directly from Nanografi. We supply GNPs in various surface areas and thicknesses for both research and industrial use, with worldwide shipping.

How much do graphene nanoplatelets cost?

Graphene nanoplatelet price depends on surface area, thickness, purity, and order volume. Nanografi provides best-priced GNPs for both research and industrial quantities. See the product listings above for current pricing.

What is the difference between graphene nanoplatelets and graphene?

Graphene is a single atomic layer of carbon, while graphene nanoplatelets consist of multiple stacked graphene layers. GNPs are more cost-effective and easier to process at scale, making them ideal for composites and coatings.

What are graphene nanoplatelets used for?

Common applications include composite reinforcement, conductive coatings and inks, energy storage electrodes, EMI shielding, anti-static coatings, and thermal management.

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