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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...NG0ST02LA17Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST02LA02Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA01Qty in Cart: 0Quantity:Price:Subtotal: