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Titanium Nitride (TiN) Nanopowder/Nanoparticles, Purity: 99.2+%, Size: 20 nm, Cubic

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5 grams/39 €                          
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100 grams/118 € 

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Titanium Nitride (TiN) Nanopowder/Nanoparticles

Purity: 99.2+%, Size: 20 nm, Cubic 

Titanium Nitride (TiN) Nanoparticles are high-performance refractory ceramics synthesized via the plasma arc vapor phase method, resulting in a stable cubic crystalline structure with exceptional extreme-environment durability. Known for their metallic-like conductivity and gold-like optical properties, these nanoparticles serve as an ultra-hard reinforcement phase that significantly enhances friction reduction and wear resistance in composite materials. Beyond their mechanical strength, TiN nanoparticles act as an efficient diffusion barrier and thermal conductor, offering high-temperature chemical stability that remains resilient up to their impressive melting point of 2950°C. Their chemically inert nature and biocompatibility make them indispensable for advanced applications ranging from semiconductor interconnects to medical prosthetics, while their specialized zeta potential ensures high dispersibility for precision coating and thin-film technologies.

Technical Properties

Purity  99.2+%      
Average Particle Size  20 nm      
Specific Surface Area  50-80 m2/g      
Bulk Density  0.08 g/cm3      
True Density  5.3 g/cm3      
Melting Point
2950 °C      
Crystal Phase Cubic      
Zeta Potential  -17,50 mV      
Manufacturing Method Plasma arc vapor phase      
CAS No 25583-20-4      
Elemental Analysis (%) Ti N C Fe
  77.8 21,90 0.0002 0.0015

Applications

  • Advanced Cutting Tools and Industrial Molds: Employed as a high-durability coating to extend the lifespan of drills, milling cutters, and plastic molds. The nanometric particles reduce surface roughness and provide an ultra-hard barrier against abrasive wear and friction-induced heat.
  • Microelectronics and Semiconductors: Serves as a critical barrier layer in interconnect metallization to prevent copper diffusion into silicon substrates. It is also utilized as a gate electrode in metal-oxide-semiconductor (MOS) transistors and for fabricating low-barrier Schottky diodes due to its stable work function.
  • Biomedical Implants and Prosthetics: Due to its non-toxic nature and excellent biocompatibility, TiN is used to coat artificial limbs, hip replacements, and dental implants. It minimizes the release of metallic ions into the body while providing a wear-resistant surface for articulating joints.
  • Aerospace and Defense: Integrated into structural components and thermal protection systems that must withstand temperatures approaching 3000°C. Its high chemical stability prevents degradation in aggressive oxidative or corrosive environments.
  • Energy and Plasmonics: Emerging research utilizes TiN nanoparticles in solar thermal harvesters and plasmonic devices as an alternative to noble metals. Its broad absorption spectrum allows for efficient light-to-heat conversion in sustainable energy applications.
  • Decorative and Protective Coatings: Used in specialized thin films to provide both aesthetic appeal and scratch resistance for luxury hardware, automotive parts, and consumer electronics.

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