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Rare Earth Materials

Rare Earth Materials

As a leading supplier and solution partner in the nanotechnology industry, Nanografi provides a wide range of high-quality rare earth elements for various applications.

Rare earth elements consist of seventeen elements including fifteen lanthanide elements plus scandium and yttrium. These elements play a significant role in modern technologies and are used in everyday applications such as computers, cell phones, batteries, magnets, DVDs, catalysis, and fluorescence.

Nanografi offers rare earth elements as pure metals or as oxides, and even in the form of metallic and oxide nanoparticles for use in nanotechnological applications. Choose Nanografi to meet your unique needs with end-to-end service and solutions.

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  •  Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA46
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA45
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA44
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA43
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA42
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  • Lanthanum Aluminate (indium)(LaAlO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST01LA26
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  • Lanthanum Aluminate (indium)(LaAlO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST01LA25
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER16
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER15
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01ER14
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER13
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER12
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness:0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness:0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER11
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER10
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER09
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE018
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE17
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE017
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE16
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE15
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE14
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:7'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE013
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:7'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE12
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:6'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE11
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  • Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE10
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:5'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE09
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:5'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE08
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99% Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE07
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE06
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE05
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE4
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE04
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE03
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CH02
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE01
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  • Thulium (Tm) Micron Powder, Purity: 99.5 %, Size: 325 mesh- NG07RE1501

    Thulium (Tm) Micron Powder, Purity: 99.5 %, Size: 325 mesh

      Thulium (Tm) Micron Powder Purity: 99.5 %, Size: 325 mesh  Technical Properties: PURITY  99.5 % PARTICLE SIZE 325 mesh  MELTING POINT 1545 °C BOILING...
    NG07RE1501
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  • Dysprosium (Dy) Micron Powder, Purity: 99.5 %, Size: 325 mesh- NG07RE1201

    Dysprosium (Dy) Micron Powder, Purity: 99.5 %, Size: 325 mesh

      Dysprosium (Dy) Micron Powder Purity: 99.5 %, Size: 325 mesh  Technical Properties: PURITY  99.5 % PARTICLE SIZE 325 mesh  MELTING POINT  1412 °C BOILING...
    NG07RE1201
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  • Samarium (Sm) Micron Powder, Purity: 99.5 %, Size: 325 mesh- NG07RE0801

    Samarium (Sm) Micron Powder, Purity: 99.5 %, Size: 325 mesh

      Samarium (Sm) Micron Powder Purity: 99.5 %, Size: 325 mesh   Technical Properties: PURITY  99.5 % PARTICLE SIZE 325 mesh  MELTING POINT  1077 °C BOILING...
    NG07RE0801
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  • Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-110 nm- NG04SO2902

    Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-110 nm

    Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles Purity: 99.95%, Size: 8-110 nm   Technical Properties: Purity (%) 99.95     Average Particle Size (nm) 8-110     Specific Surface Area...
    NG04SO2902
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