Rare Earth Materials
As a leading supplier and solution partner in the nanotechnology industry, Nanografi provides a wide range of high-quality rare earth elements for various applications.
Rare earth elements consist of seventeen elements including fifteen lanthanide elements plus scandium and yttrium. These elements play a significant role in modern technologies and are used in everyday applications such as computers, cell phones, batteries, magnets, DVDs, catalysis, and fluorescence.
Nanografi offers rare earth elements as pure metals or as oxides, and even in the form of metallic and oxide nanoparticles for use in nanotechnological applications. Choose Nanografi to meet your unique needs with end-to-end service and solutions.
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Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST01LA46Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST01LA45Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST01LA44Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST01LA43Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST01LA42Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...NG0ST01LA26Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...NG0ST01LA25Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER16Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER15Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01ER14Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER13Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER12Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness:0.125''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness:0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER11Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER10Qty in Cart: 0Quantity:Price:Subtotal: -
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''
Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01ER09Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST01CE018Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 3'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST01CE17Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST01CE017Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST01CE16Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE15Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE14Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE013Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE12Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE11Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE10Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE09Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE08Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE07Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE06Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE05Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE4Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE04Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CE03Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...NG0ST01CH02Qty in Cart: 0Quantity:Price:Subtotal: -
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''
Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...NG0ST01CE01Qty in Cart: 0Quantity:Price:Subtotal: -
Thulium (Tm) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Thulium (Tm) Micron Powder Purity: 99.5 %, Size: 325 mesh Technical Properties: PURITY 99.5 % PARTICLE SIZE 325 mesh MELTING POINT 1545 °C BOILING...NG07RE1501Qty in Cart: 0Quantity:Price:Subtotal: -
Dysprosium (Dy) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Dysprosium (Dy) Micron Powder Purity: 99.5 %, Size: 325 mesh Technical Properties: PURITY 99.5 % PARTICLE SIZE 325 mesh MELTING POINT 1412 °C BOILING...NG07RE1201Qty in Cart: 0Quantity:Price:Subtotal: -
Samarium (Sm) Micron Powder, Purity: 99.5 %, Size: 325 mesh
Samarium (Sm) Micron Powder Purity: 99.5 %, Size: 325 mesh Technical Properties: PURITY 99.5 % PARTICLE SIZE 325 mesh MELTING POINT 1077 °C BOILING...NG07RE0801Qty in Cart: 0Quantity:Price:Subtotal: -
Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-110 nm
Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles Purity: 99.95%, Size: 8-110 nm Technical Properties: Purity (%) 99.95 Average Particle Size (nm) 8-110 Specific Surface Area...NG04SO2902Qty in Cart: 0Quantity:Price:Subtotal: