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Lanthanum Nickel Oxide Sputtering Targets

Lanthanum Nickel Oxide Sputtering Targets

The lanthanum nickel oxide theoretical prediction for superconductivity has triggered intensive research efforts. Lanthanum nickel oxide has the property of staying paramagnetic and metallic down to the lowest temperatures. This property is unique to lanthanum nickel oxide among other rare earth nickelates. The thin films of lanthanum nickel oxide are good materials used in supercapacitor, solid oxide fuel cell cathode, superconducting and catalyst. The purity of lanthanum nickel oxide that we provide is 99.9%. We take the highest care in the manufacturing of this material. It is produced with high purity metal oxide precursor materials, high energy mixing, powder synthesis, and particle processing processes. Apart from that, we use the proprietary process employed for sintering and pressing and multiple-step densification. We take great care in packaging our product for our customers. Special care is taken to avoid environmental contamination and protection is given during shipment.

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  • Lanthanum Nickel Oxide (indium)(LaNiO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA18
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  • Lanthanum Nickel Oxide (indium)(LaNiO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST02LA17
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA16
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA15
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:7'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA14
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:7'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA13
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:6'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA12
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:6'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA11
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:5'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA10
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:5'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA09
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA08
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA07
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA06
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA05
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA04
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA03
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA02
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA01
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