Sputtering Targets

As a leading supplier of high-quality nanomaterials and nanotechnology-based products, Nanografi offers a wide range of sputtering targets for various applications.

What Are Sputtering Targets?

Sputtering targets are solid source materials used in physical vapor deposition (PVD) to create thin films on substrates. During the sputtering process, high-energy ions bombard the target surface, ejecting atoms that deposit as a uniform coating on the desired material. This technique is widely adopted in semiconductor fabrication, optical coatings, solar cell manufacturing, and decorative finishes.

Sputtering Target Applications

Common applications include transparent conductive coatings for displays, anti-reflective layers for optical components, metallic and ceramic coatings for wear-resistant tooling, and electrode deposition for battery and sensor devices. Target materials range from pure metals like aluminum, titanium, and chromium to complex oxides, nitrides, and alloys depending on the desired film properties. Nanografi also supplies rare earth sputtering targets for specialized magnetic and optical thin-film applications.

Buy Sputtering Targets at Nanografi

Nanografi offers sputtering targets in sizes from 1" to 8" across a broad range of compositions, with high purity and density to ensure consistent film quality. Browse the categories below to find the target material and dimension your deposition process requires.