Sputtering Targets
Sputtering targets are solid source materials used in physical vapor deposition (PVD) to deposit thin films onto substrates.
Nanografi supplies a wide range of high-purity metal, oxide, nitride, alloy, and rare earth sputtering targets in sizes from 1" to 8", engineered for consistent film quality, all at competitive prices with worldwide shipping.
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Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.125''
$350.131 piece/307 € Please contact us for quotes on larger quantities !!! Carbon (C) (Pyrolytic Graphite) Sputtering Targets Purity: 99.999%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of...NG0ST02CA28$350.13 -
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''
$226.961 piece/199 € Please contact us for quotes on larger quantities !!! Carbon (C) (Pyrolytic Graphite) Sputtering Targets Purity: 99.999%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA27$226.96 -
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 4'', Thickness: 0.125''
$768.701 piece/674 € Please contact us for quotes on larger quantities !!! Carbon (C) Sputtering Targets, indium Purity: 99.999%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from...NG0ST02CA25$768.70 -
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 3'', Thickness: 0.125''
$685.441 piece/601 € Please contact us for quotes on larger quantities !!! Carbon (C) Sputtering Targets, indium Purity: 99.999%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST02CA24$685.44 -
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 2'', Thickness: 0.125''
$404.881 piece/355 € Please contact us for quotes on larger quantities !!! Carbon (C) Sputtering Targets, indium Purity: 99.999%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA23$404.88 -
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 1'', Thickness: 0.125''
$386.631 piece/339 € Please contact us for quotes on larger quantities !!! Carbon (C) Sputtering Targets, indium Purity: 99.999%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films...NG0ST02CA22$386.63 -
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.250''
$255.471 piece/224 € Please contact us for quotes on larger quantities !!! Carbon (C) (Graphite) Sputtering Targets Purity: 99.999%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films...NG0ST02CA21$255.47 -
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''
$245.211 piece/215 € Please contact us for quotes on larger quantities !!! Carbon (C) (Graphite) Sputtering Targets Purity: 99.999%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST02CA20$245.21 -
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.250''
$241.791 piece/212 € Please contact us for quotes on larger quantities !!! Carbon (C) (Graphite) Sputtering Targets Purity: 99.999%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST02CA19$241.79 -
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''
$173.361 piece/152 € Please contact us for quotes on larger quantities !!! Carbon (C) (Graphite) Sputtering Targets Purity: 99.999%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST02CA18$173.36 -
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''
$164.231 piece/144 € Please contact us for quotes on larger quantities !!! Carbon (C) (Graphite) Sputtering Targets Purity: 99.999%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST02CA17$164.23 -
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''
$114.051 piece/100 € Please contact us for quotes on larger quantities !!! Carbon (C) (Graphite) Sputtering Targets Purity: 99.999%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST02CA15$114.05 -
Calcium Manganate (CaMnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''
$1,385.711 piece/1215 € Please contact us for quotes on larger quantities !!! Calcium Manganate (CaMnO3) Sputtering Targets, indium Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology...NG0ST02CA14$1,385.71 -
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''
$473.311 piece/415 € Please contact us for quotes on larger quantities !!! Calcium Manganate (CaMnO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of...NG0ST02CA13$473.31 -
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''
$621.571 piece/545 € Please contact us for quotes on larger quantities !!! Calcium Manganate (CaMnO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA12$621.57 -
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''
$439.091 piece/385 € Please contact us for quotes on larger quantities !!! Calcium Manganate (CaMnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA11$439.09 -
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''
$874.761 piece/767 € Please contact us for quotes on larger quantities !!! Calcium Manganate (CaMnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA010$874.76 -
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''
$735.621 piece/645 € Please contact us for quotes on larger quantities !!! Calcium Manganate (Ca(MnO4)2) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA09$735.62 -
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
$539.461 piece/473 € Please contact us for quotes on larger quantities !!! Calcium Manganate (CaMnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA08$539.46 -
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
$751.591 piece/659 € Please contact us for quotes on larger quantities !!! Calcium Manganate (CaMnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA07$751.59 -
Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
$325.041 piece/285 € Please contact us for quotes on larger quantities !!! Calcium Manganate (CaMnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST02CA06$325.04 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 8'', Thickness: 0.250''
$1,683.381 piece/1476 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 8'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST01BO33$1,683.38 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 8'', Thickness: 0.125''
$1,539.681 piece/1350 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 8'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from...NG0ST01BO32$1,539.68 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 6'', Thickness: 0.250''
$855.381 piece/750 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 6'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BO31$855.38 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 6'', Thickness: 0.125''
$741.331 piece/650 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BO30$741.33 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 4'', Thickness: 0.250''
$638.681 piece/560 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BO29$638.68 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 4'', Thickness: 0.125''
$581.661 piece/510 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BO28$581.66 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.250''
$675.181 piece/592 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BO27$675.18 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.125''
$548.581 piece/481 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BO26$548.58 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.250''
$565.691 piece/469 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from...NG0ST01BO25$565.69 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125''
$451.641 piece/396 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BO24$451.64 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.250''
$403.741 piece/354 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BO23$403.74 -
Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.125''
$363.821 piece/319 € Please contact us for quotes on larger quantities !!! Boron Nitride (BN) Sputtering Targets Purity: 99.5%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films...NG0ST01BO22$363.82 -
Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 4'', Thickness: 0.125''
$1,068.651 piece/937 € Please contact us for quotes on larger quantities !!! Boron Carbide (B4C) Sputtering Targets, indium Purity: 99.5%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST01BO20$1,068.65 -
Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 3'', Thickness: 0.125''
$985.391 piece/864 € Please contact us for quotes on larger quantities !!! Boron Carbide (B4C) Sputtering Targets, indium Purity: 99.5%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing...NG0ST01BO19$985.39 -
Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 2'', Thickness: 0.125''
$723.081 piece/634 € Please contact us for quotes on larger quantities !!! Boron Carbide (B4C) Sputtering Targets, indium Purity: 99.5%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films...NG0ST01BO18$723.08 -
Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 1'', Thickness: 0.125''
$659.211 piece/578 € Please contact us for quotes on larger quantities !!! Boron Carbide (B4C) Sputtering Targets, indium Purity: 99.5%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing...NG0ST01BO17$659.21 -
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5, Size: 8'', Thickness: 0.250''
$1,505.461 piece/1320 € Please contact us for quotes on larger quantities !!! Boron Carbide (B4C) Sputtering Targets Purity: 99.5, Size: 8'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST01BO16$1,505.46 -
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 8'', Thickness: 0.125''
$611.311 piece/536 € Please contact us for quotes on larger quantities !!! Boron Carbide (B4C) Sputtering Targets Purity: 99.5%, Size: 8'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST01BO15$611.31 -
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 6'', Thickness: 0.125''
$650.091 piece/570 € Please contact us for quotes on larger quantities !!! Boron Carbide (B4C) Sputtering Targets Purity: 99.5%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST01BO13$650.09
What Are Sputtering Targets?
Sputtering targets are solid source materials used in physical vapor deposition (PVD) to create thin films on substrates. During the sputtering process, high-energy ions bombard the target surface, ejecting atoms that deposit as a uniform coating on the desired material. This technique is widely adopted in semiconductor fabrication, optical coatings, solar cell manufacturing, and decorative finishes. The same approach plays a central role in nanotechnology and thin-film engineering, where precise, uniform layers are essential.
Sputtering Target Applications
Common applications include transparent conductive coatings for displays, anti-reflective layers for optical components, metallic and ceramic coatings for wear-resistant tooling, and electrode deposition for battery and sensor devices. Target materials range from pure metals like aluminum, titanium, and chromium to complex oxides, nitrides, and alloys depending on the desired film properties. Specialized options such as molybdenum targets are used in electronics and display films, while platinum targets serve catalysis, sensors, and protective coatings. Nanografi also supplies rare earth sputtering targets for specialized magnetic and optical thin-film applications.
Types of Sputtering Targets
- Pure metal and elemental targets such as aluminum, titanium, chromium, and copper
- Oxide targets for transparent conductive and dielectric films
- Nitride and ceramic targets for hard, wear-resistant coatings
- Alloy targets for tailored film composition
- Tungsten disulfide and other specialty targets for low-friction and lubricating films
- Rare earth targets for magnetic and optical applications
Key Properties of Sputtering Targets
- High purity for clean, defect-free thin films
- High density to ensure uniform sputtering and film consistency
- Controlled grain structure for stable deposition rates
- Available in sizes from 1" to 8" to fit standard PVD systems
- Broad range of metals, oxides, nitrides, and alloys
- Compatible with semiconductor, optical, and decorative coating processes
Sputtering Targets Price and Market
The global sputtering targets market continues to grow, driven by semiconductors, displays, solar energy, and optical coatings. Sputtering target prices vary depending on the material, purity, density, and size, from small research-scale targets to large production targets. As a trusted sputtering target supplier, Nanografi offers transparent, competitive pricing across metals, oxides, nitrides, alloys, and rare earth compositions, so you can source the right target for your deposition process and budget. Check the product listings above for up-to-date prices and specifications.
Frequently Asked Questions
Where can I buy sputtering targets?
You can buy sputtering targets directly from Nanografi. We supply high-purity metal, oxide, nitride, alloy, and rare earth targets in sizes from 1" to 8", for both research and industrial use, with worldwide shipping.
How much do sputtering targets cost?
Sputtering target prices depend on the material, purity, density, and size. Nanografi provides competitively priced targets for both research and production quantities. See the product listings above for current pricing.
What sizes of sputtering targets are available?
Nanografi offers sputtering targets in sizes from 1" to 8", across a broad range of compositions, with high purity and density for consistent film quality.
What is a sputtering target used for?
Sputtering targets are used in physical vapor deposition to create thin films for semiconductors, displays, optical and anti-reflective coatings, solar cells, wear-resistant tooling, and decorative finishes.
Buy Sputtering Targets at Nanografi
Nanografi offers sputtering targets in sizes from 1" to 8" across a broad range of compositions, with high purity and density to ensure consistent film quality. As a leading supplier of advanced materials, we help you find the exact target material and dimension your deposition process requires, so browse the categories above and place your order today with worldwide shipping.