Sputtering Targets
Sputtering targets are solid source materials used in physical vapor deposition (PVD) to deposit thin films onto substrates.
Nanografi supplies a wide range of high-purity metal, oxide, nitride, alloy, and rare earth sputtering targets in sizes from 1" to 8", engineered for consistent film quality, all at competitive prices with worldwide shipping.
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Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 4'', Thickness: 0.250''
€209.001 piece/209 € Please contact us for quotes on larger quantities !!! Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz Purity: 99.995%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of...NG0ST01SI72€209.00 -
Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 4'', Thickness: 0.125''
€619.001 piece/619 € Please contact us for quotes on larger quantities !!! Silicon Carbide (SiC) Sputtering Targets Purity: 99.5%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST01SI58€619.00 -
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.125''
€80.001 piece/80 € Please contact us for quotes on larger quantities !!! Carbon (C) (Graphite) Sputtering Targets Purity: 99.999%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films...NG0ST02CA16€80.00 -
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
€327.001 piece/327 € Please contact us for quotes on larger quantities !!! Vanadium Oxide (V2O5) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films...NG0ST01VA22€327.00 -
Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''
€660.001 piece/660 € Please contact us for quotes on larger quantities !!! Antimony Telluride (Sb2Te3) Sputtering Targets Purity: 99.999%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films...NG0ST01AT15€660.00 -
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125''
€184.001 piece/184 € Please contact us for quotes on larger quantities !!! Vanadium (V) Sputtering Targets Purity: 99.5%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from...NG0ST01VA03€184.00 -
Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.125''
€159.001 piece/159 € Please contact us for quotes on larger quantities !!! Germanium (Ge) Sputtering Targets Purity: 99.999%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01GE02€159.00 -
Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.125''
€179.001 piece/179 € Please contact us for quotes on larger quantities !!! Carbon (C) (Pyrolytic Graphite) Sputtering Targets Purity: 99.999%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing...NG0ST02CA26€179.00 -
Boron (B) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
€273.001 piece/273 € Please contact us for quotes on larger quantities !!! Boron (B) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety...NG0ST01BO01€273.00 -
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''
€660.001 piece/660 € Please contact us for quotes on larger quantities !!! Bismuth Telluride (Bi2Te3) Sputtering Targets Purity: 99.999%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST01BI58€660.00 -
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
€448.001 piece/448 € Please contact us for quotes on larger quantities !!! Lithium Niobate (LiNbO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing...NG0ST01LI16€448.00 -
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''
€727.001 piece/727 € Please contact us for quotes on larger quantities !!! Barium Fluoride (BaF2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of...NG0ST01BA10€727.00 -
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''
€171.001 piece/171 € Please contact us for quotes on larger quantities !!! Aluminum (Al) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST01AL13€171.00 -
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''
€110.001 piece/110 € Please contact us for quotes on larger quantities !!! Aluminum (Al) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST01AL07€110.00 -
Zinc Sulfide (ZnS) Pellets, Purity: 99.99%, Size: 1-10 mm
€90.00100 grams: 90€500 grams: 280€1000 grams: 435€ Contact us for tailored quotes on larger quantities & experience exceptional solutions from our experts. Zinc Sulfide (ZnS) Pellets, Purity: 99.99%, Size: 1-10...NG10STMW1171€90.00 -
Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
€475.001 piece/475 € Please contact us for quotes on larger quantities !!! Zinc Oxide (ZnO) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing...NG0ST01ZN35€475.00 -
Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''
€200.001 piece/200 € Please contact us for quotes on larger quantities !!! Tungsten (W) Sputtering Targets Purity: 99.95%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST01TU03€200.00 -
Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.250''
€516.001 piece/516 € Please contact us for quotes on larger quantities !!! Titanium Nitride (TiN) Sputtering Targets Purity: 99.5%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of...NG0ST02TI05€516.00 -
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''
€720.001 piece/720 € Please contact us for quotes on larger quantities !!! Tantalum (Ta) Sputtering Targets Purity: 99.95%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST01TA07€720.00 -
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 2'', Thickness: 0.125''
€81.001 piece/81 € Please contact us for quotes on larger quantities !!! Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz Purity: 99.995%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of...NG0ST01SI67€81.00 -
Niobium Oxide (Nb2O5) Sputtering Targets, indium, Purity: 99.5%, Size: 2'', Thickness: 0.125''
€486.001 piece/486 € Please contact us for quotes on larger quantities !!! Niobium Oxide (Nb2O5) Sputtering Targets, indium Purity: 99.5%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of...NG0ST02NI41€486.00 -
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
€572.001 piece/572 € Please contact us for quotes on larger quantities !!! Lithium Cobalt Oxide (LiCoO2) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of...NG0ST01LI02€572.00 -
Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
€576.001 piece/576 € Please contact us for quotes on larger quantities !!! Indium Zinc Oxide/IZO (InZnO) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST01IN97€576.00 -
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''
€300.001 piece/300 € Please contact us for quotes on larger quantities !!! Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing...NG0ST01IN47€300.00 -
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''
€149.001 piece/149 € Please contact us for quotes on larger quantities !!! Copper (Cu) Sputtering Targets Purity: 99.999%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST02CO08€149.00 -
Boron Carbide (B4C) Sputtering Targets, Purity: 99.5%, Size: 6'', Thickness: 0.250''
€550.001 piece/550 € Please contact us for quotes on larger quantities !!! Boron Carbide (B4C) Sputtering Targets Purity: 99.5%, Size: 6'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...NG0ST01BO14€550.00 -
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.125''
€255.001 piece/255 € Please contact us for quotes on larger quantities !!! Bismuth (Bi) Sputtering Targets Purity: 99.999%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide...NG0ST01BI03€255.00 -
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.125''
€225.001 piece/225 € Please contact us for quotes on larger quantities !!! Bismuth (Bi) Sputtering Targets Purity: 99.999%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a...NG0ST01BI01€225.00 -
Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''
€660.001 piece/660 € Please contact us for quotes on larger quantities !!! Barium Fluoride (BaF2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin...NG0ST01BA09€660.00 -
Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''
€79.001 piece/79 € Please contact us for quotes on larger quantities !!! Aluminum Silicon Copper (AlSiCu) Sputtering Targets Purity: 99.999%, Size: 3'', Thickness: 0.125'' Sputtering is a proven...NG0ST01AL75€79.00 -
Zinc Selenide Discs, Purity: 99.99%, Dia:20mm, Thickness:3mm, 2-side polished
€1,640.00100 pieces: 1640€500 pieces: 7250€ Contact us for tailored quotes on larger quantities & experience exceptional solutions from our experts. Zinc Selenide Discs, Purity: 99.99%, Dia:20mm, Thickness:3mm, 2-side...NG10BEW1080€1,640.00 -
Silicon Monoxide (SiO) Pellets, Purity: 99.99%, Size: 1-3 mm
€65.00100 grams: 65€500 grams: 245€1000 grams: 340€ Contact us for tailored quotes on larger quantities & experience exceptional solutions from our experts. Silicon Monoxide (SiO) Pellets, Purity: 99.99%, Size: 1-3...NG10MPW1434€65.00 -
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125'', Beige to White
€2,002.001 piece/2002 € Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Sputtering Targets, indium Purity: 99.99%, Size: 4'', Thickness: 0.125'', Beige to White Sputtering is a proven...NG0ST01TI80€2,002.00 -
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125'', Beige to White
€1,430.001 piece/1430 € Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125'', Beige to White Sputtering is a proven technology capable of depositing thin...NG0ST01TI79€1,430.00 -
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125'', Beige to White
€980.001 piece/980 € Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Sputtering Targets, indium Purity: 99.99%, Size: 2'', Thickness: 0.125'', Beige to White Sputtering is a proven technology capable of...NG0ST01TI78€980.00 -
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1'', Thickness: 0.125'', Beige to White
€823.001 piece/823 € Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Sputtering Targets, indium Purity: 99.99%, Size: 1'', Thickness: 0.125'', Beige to White Sputtering is a proven technology capable of...NG0ST01TI77€823.00 -
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.95%, Size: 4'', Thickness: 0.125'' , Grey to Black
€909.001 piece/909 € Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Sputtering Targets, indium Purity: 99.95%, Size: 4'', Thickness: 0.125'' , Grey to Black Sputtering is a proven technology...NG0ST01TI76€909.00 -
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 4'', Thickness: 0.125'', Grey to Black
€986.001 piece/986 € Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Sputtering Targets, indium Purity: 99.9%, Size: 4'', Thickness: 0.125'', Grey to Black Sputtering is a proven technology capable of depositing...NG0ST01TI75€986.00 -
Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125'', Grey to Black
€928.001 piece/928 € Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Sputtering Targets, indium Purity: 99.9%, Size: 3'', Thickness: 0.125'', Grey to Black Sputtering is a proven technology capable of...NG0ST01TI74€928.00 -
Titanium Dioxide (TiO2) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2'', Thickness: 0.125'', Grey to Black
€594.001 piece/594 € Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Sputtering Targets, elastomer Purity: 99.9%, Size: 2'', Thickness: 0.125'', Grey to Black Sputtering is a proven technology capable of depositing...NG0ST01TI73€594.00
What Are Sputtering Targets?
Sputtering targets are solid source materials used in physical vapor deposition (PVD) to create thin films on substrates. During the sputtering process, high-energy ions bombard the target surface, ejecting atoms that deposit as a uniform coating on the desired material. This technique is widely adopted in semiconductor fabrication, optical coatings, solar cell manufacturing, and decorative finishes. The same approach plays a central role in nanotechnology and thin-film engineering, where precise, uniform layers are essential.
Sputtering Target Applications
Common applications include transparent conductive coatings for displays, anti-reflective layers for optical components, metallic and ceramic coatings for wear-resistant tooling, and electrode deposition for battery and sensor devices. Target materials range from pure metals like aluminum, titanium, and chromium to complex oxides, nitrides, and alloys depending on the desired film properties. Specialized options such as molybdenum targets are used in electronics and display films, while platinum targets serve catalysis, sensors, and protective coatings. Nanografi also supplies rare earth sputtering targets for specialized magnetic and optical thin-film applications.
Types of Sputtering Targets
- Pure metal and elemental targets such as aluminum, titanium, chromium, and copper
- Oxide targets for transparent conductive and dielectric films
- Nitride and ceramic targets for hard, wear-resistant coatings
- Alloy targets for tailored film composition
- Tungsten disulfide and other specialty targets for low-friction and lubricating films
- Rare earth targets for magnetic and optical applications
Key Properties of Sputtering Targets
- High purity for clean, defect-free thin films
- High density to ensure uniform sputtering and film consistency
- Controlled grain structure for stable deposition rates
- Available in sizes from 1" to 8" to fit standard PVD systems
- Broad range of metals, oxides, nitrides, and alloys
- Compatible with semiconductor, optical, and decorative coating processes
Sputtering Targets Price and Market
The global sputtering targets market continues to grow, driven by semiconductors, displays, solar energy, and optical coatings. Sputtering target prices vary depending on the material, purity, density, and size, from small research-scale targets to large production targets. As a trusted sputtering target supplier, Nanografi offers transparent, competitive pricing across metals, oxides, nitrides, alloys, and rare earth compositions, so you can source the right target for your deposition process and budget. Check the product listings above for up-to-date prices and specifications.
Frequently Asked Questions
Where can I buy sputtering targets?
You can buy sputtering targets directly from Nanografi. We supply high-purity metal, oxide, nitride, alloy, and rare earth targets in sizes from 1" to 8", for both research and industrial use, with worldwide shipping.
How much do sputtering targets cost?
Sputtering target prices depend on the material, purity, density, and size. Nanografi provides competitively priced targets for both research and production quantities. See the product listings above for current pricing.
What sizes of sputtering targets are available?
Nanografi offers sputtering targets in sizes from 1" to 8", across a broad range of compositions, with high purity and density for consistent film quality.
What is a sputtering target used for?
Sputtering targets are used in physical vapor deposition to create thin films for semiconductors, displays, optical and anti-reflective coatings, solar cells, wear-resistant tooling, and decorative finishes.
Buy Sputtering Targets at Nanografi
Nanografi offers sputtering targets in sizes from 1" to 8" across a broad range of compositions, with high purity and density to ensure consistent film quality. As a leading supplier of advanced materials, we help you find the exact target material and dimension your deposition process requires, so browse the categories above and place your order today with worldwide shipping.