Lithium Phosphate Sputtering Targets

Lithium Phosphate sputtering target is well known for its special features including high density, Stoichiometric properties, high purity, homogeneously, and has the smallest possible size of a grain used in coating processes like PVD (physical vapor deposition) and CVD (chemical vapor deposition). Chemically formulated Li3PO4 also has important uses as an electrolyte layer in thin-film rechargeable batteries, in semiconductors, and many other optical applications. Thin-film Lithium Phosphate sputtering targets are mostly available in monoblock or bonded to planar target dimensions which can work with both older as well as latest sputtering devices. It has applications such as film coating for fuel cells, solar energy, and flip-chip applications. "Sputtering" is a process of thin-film coating of high purity sputtering metal or oxide material on another surface by using fast ions of target materials to eject particles of it from a target. We produce Lithium Phosphate sputtering targets in custom sizes to meet the demands of all customers.