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Rare Earth Materials

Rare Earth Materials

Nanografi supplies rare earth materials for advanced research and industrial applications, including rare earth element powders, oxide powders, compound powders, nanoparticles and sputtering targets. Explore materials such as cerium, neodymium, yttrium, dysprosium and lanthanum for magnets, batteries, catalysis, optics, electronics and thin-film technologies.

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  • Praseodymium (Pr) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Praseodymium (Pr) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01PR05
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  • Praseodymium (Pr) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Praseodymium (Pr) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01PR04
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  • Praseodymium (Pr) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Praseodymium (Pr) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01PR03
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  • Praseodymium (Pr) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Praseodymium (Pr) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01PR02
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  • Selenium (Se) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.999%

    Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Praseodymium (Pr) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01PR01
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA80
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA79
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:7'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA78
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:7'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA77
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:6'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA76
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:6'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA75
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:5'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA74
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:5'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA73
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA72
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA71
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA70
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA69
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA68
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA67
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA66
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA65
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3)(indium) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA64
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA51
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA50
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA49
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA48
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA47
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3)(indium) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse...
    NG0ST02LA46
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA37
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA36
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA35
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA34
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA33
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA32
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA31
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA30
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  • Lanthanum Nickel Oxide (indium)(LaNiO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA18
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  • Lanthanum Nickel Oxide (indium)(LaNiO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST02LA17
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA16
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA15
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Rare Earth Materials for Advanced Research and Industrial Applications

Rare earth materials are essential inputs for high-performance technologies that require magnetic, optical, catalytic, electronic or thermal functionality. This category includes rare earth element powders, rare earth oxide powders, rare earth compound powders, nanoparticles and sputtering targets designed for laboratory research, product development and industrial material engineering.

Nanografi offers a broad portfolio of rare earth materials including cerium, dysprosium, erbium, europium, gadolinium, holmium, lanthanum, neodymium, praseodymium, samarium, scandium, terbium, thulium, ytterbium and yttrium-based products. These materials are widely evaluated in applications such as permanent magnets, batteries, catalysts, phosphors, ceramics, coatings, optical systems, electronic components and thin-film deposition.

Available Rare Earth Material Types

The product range covers multiple material formats to support different technical requirements. Rare earth element powders are used when metallic composition and particle characteristics are critical. Rare earth oxide powders such as cerium oxide, neodymium oxide, yttrium oxide and lanthanum oxide are suitable for ceramics, polishing, catalysis, optical materials and functional coatings. Rare earth compound powders, including lanthanum hexaboride, lanthanum trifluoride and yttrium aluminate, support specialized applications that require defined chemical composition and performance stability. Rare earth sputtering targets are used in thin-film coating, vacuum deposition and advanced surface engineering processes.

Key Application Areas

Rare earth materials are selected for their unique electronic structures and performance advantages in demanding systems. Neodymium, dysprosium, praseodymium and samarium-based materials are commonly associated with magnetic applications. Cerium and lanthanum-based materials are frequently used in catalysis, polishing and ceramic technologies. Europium, terbium, yttrium and gadolinium-based materials are important for optical, phosphor and luminescent systems. Yttrium, scandium and lanthanide compounds are also used in advanced ceramics, solid-state devices and thin-film research.

How to Select the Right Rare Earth Material

Choosing the right rare earth material depends on the target application, chemical form, purity requirement, particle size, morphology and process conditions. For powder metallurgy, ceramics or catalyst development, particle size distribution and oxide composition are key parameters. For thin-film deposition, target composition, density and compatibility with the coating system should be considered. For nanotechnology research, nanoparticle size, dispersion behavior and surface characteristics can directly affect performance.

Why Choose Nanografi Rare Earth Materials?

Nanografi provides rare earth materials for customers working in advanced materials, nanotechnology, electronics, energy, optics, coatings and industrial R&D. With a portfolio covering elemental powders, oxide powders, compound powders, nanoparticles and sputtering targets, researchers and manufacturers can source application-focused materials from a single category. Product options are designed to support precise material selection, technical evaluation and scalable innovation.

Frequently Asked Questions About Rare Earth Materials

What are rare earth materials?

Rare earth materials are materials based on rare earth elements, including the lanthanide series as well as scandium and yttrium. They are used in advanced technologies because of their magnetic, optical, catalytic and electronic properties.

Which rare earth materials are available in this category?

This category includes rare earth element powders, rare earth oxide powders, rare earth compound powders, rare earth nanoparticles and rare earth sputtering targets.

What are rare earth materials used for?

Rare earth materials are used in magnets, batteries, catalysts, phosphors, ceramics, polishing systems, optical components, electronic devices, thin films and advanced coatings.

Which rare earth oxide powders are commonly used?

Common rare earth oxide powders include cerium oxide, lanthanum oxide, neodymium oxide, yttrium oxide, dysprosium oxide, erbium oxide, europium oxide, gadolinium oxide, samarium oxide and terbium oxide.

Are rare earth sputtering targets used for thin-film deposition?

Yes. Rare earth sputtering targets are used in vacuum coating and thin-film deposition processes where controlled material composition and surface functionality are required.