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Rare Earth Materials

Rare Earth Materials

Nanografi supplies rare earth materials for advanced research and industrial applications, including rare earth element powders, oxide powders, compound powders, nanoparticles and sputtering targets. Explore materials such as cerium, neodymium, yttrium, dysprosium and lanthanum for magnets, batteries, catalysis, optics, electronics and thin-film technologies.

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  •  Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA46
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA45
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA44
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA43
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  • Lanthanum Calcium Manganate(La0.7Ca0.3MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST01LA42
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  • Lanthanum Aluminate (indium)(LaAlO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST01LA26
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  • Lanthanum Aluminate (indium)(LaAlO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST01LA25
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER16
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER15
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01ER14
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER13
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER12
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness:0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness:0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER11
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER10
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  • Erbium Oxide (Er2O3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Erbium Oxide (Er2O3) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01ER09
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE018
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE17
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE017
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  • Cerium Oxide(indium) (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets, indium Purity: 99.99%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01CE16
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE15
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE14
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:7'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE013
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:7'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 7'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 7'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE12
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:6'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE11
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  • Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE10
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:5'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE09
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:5'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 5'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE08
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99% Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE07
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE06
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE05
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE4
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE04
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CE03
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process...
    NG0ST01CH02
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  • Cerium Oxide (CeO2) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99%

    Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

      Cerium Oxide (CeO2) Sputtering Targets Purity: 99.99%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The process with...
    NG0ST01CE01
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  • Thulium (Tm) Micron Powder, Purity: 99.5 %, Size: 325 mesh- NG07RE1501

    Thulium (Tm) Micron Powder, Purity: 99.5 %, Size: 325 mesh

      Thulium (Tm) Micron Powder Purity: 99.5 %, Size: 325 mesh  Technical Properties: PURITY  99.5 % PARTICLE SIZE 325 mesh  MELTING POINT 1545 °C BOILING...
    NG07RE1501
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  • Dysprosium (Dy) Micron Powder, Purity: 99.5 %, Size: 325 mesh- NG07RE1201

    Dysprosium (Dy) Micron Powder, Purity: 99.5 %, Size: 325 mesh

      Dysprosium (Dy) Micron Powder Purity: 99.5 %, Size: 325 mesh  Technical Properties: PURITY  99.5 % PARTICLE SIZE 325 mesh  MELTING POINT  1412 °C BOILING...
    NG07RE1201
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  • Samarium (Sm) Micron Powder, Purity: 99.5 %, Size: 325 mesh- NG07RE0801

    Samarium (Sm) Micron Powder, Purity: 99.5 %, Size: 325 mesh

      Samarium (Sm) Micron Powder Purity: 99.5 %, Size: 325 mesh   Technical Properties: PURITY  99.5 % PARTICLE SIZE 325 mesh  MELTING POINT  1077 °C BOILING...
    NG07RE0801
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  • Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-110 nm- NG04SO2902

    Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-110 nm

    Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles Purity: 99.95%, Size: 8-110 nm   Technical Properties: Purity (%) 99.95     Average Particle Size (nm) 8-110     Specific Surface Area...
    NG04SO2902
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Rare Earth Materials for Advanced Research and Industrial Applications

Rare earth materials are essential inputs for high-performance technologies that require magnetic, optical, catalytic, electronic or thermal functionality. This category includes rare earth element powders, rare earth oxide powders, rare earth compound powders, nanoparticles and sputtering targets designed for laboratory research, product development and industrial material engineering.

Nanografi offers a broad portfolio of rare earth materials including cerium, dysprosium, erbium, europium, gadolinium, holmium, lanthanum, neodymium, praseodymium, samarium, scandium, terbium, thulium, ytterbium and yttrium-based products. These materials are widely evaluated in applications such as permanent magnets, batteries, catalysts, phosphors, ceramics, coatings, optical systems, electronic components and thin-film deposition.

Available Rare Earth Material Types

The product range covers multiple material formats to support different technical requirements. Rare earth element powders are used when metallic composition and particle characteristics are critical. Rare earth oxide powders such as cerium oxide, neodymium oxide, yttrium oxide and lanthanum oxide are suitable for ceramics, polishing, catalysis, optical materials and functional coatings. Rare earth compound powders, including lanthanum hexaboride, lanthanum trifluoride and yttrium aluminate, support specialized applications that require defined chemical composition and performance stability. Rare earth sputtering targets are used in thin-film coating, vacuum deposition and advanced surface engineering processes.

Key Application Areas

Rare earth materials are selected for their unique electronic structures and performance advantages in demanding systems. Neodymium, dysprosium, praseodymium and samarium-based materials are commonly associated with magnetic applications. Cerium and lanthanum-based materials are frequently used in catalysis, polishing and ceramic technologies. Europium, terbium, yttrium and gadolinium-based materials are important for optical, phosphor and luminescent systems. Yttrium, scandium and lanthanide compounds are also used in advanced ceramics, solid-state devices and thin-film research.

How to Select the Right Rare Earth Material

Choosing the right rare earth material depends on the target application, chemical form, purity requirement, particle size, morphology and process conditions. For powder metallurgy, ceramics or catalyst development, particle size distribution and oxide composition are key parameters. For thin-film deposition, target composition, density and compatibility with the coating system should be considered. For nanotechnology research, nanoparticle size, dispersion behavior and surface characteristics can directly affect performance.

Why Choose Nanografi Rare Earth Materials?

Nanografi provides rare earth materials for customers working in advanced materials, nanotechnology, electronics, energy, optics, coatings and industrial R&D. With a portfolio covering elemental powders, oxide powders, compound powders, nanoparticles and sputtering targets, researchers and manufacturers can source application-focused materials from a single category. Product options are designed to support precise material selection, technical evaluation and scalable innovation.

Frequently Asked Questions About Rare Earth Materials

What are rare earth materials?

Rare earth materials are materials based on rare earth elements, including the lanthanide series as well as scandium and yttrium. They are used in advanced technologies because of their magnetic, optical, catalytic and electronic properties.

Which rare earth materials are available in this category?

This category includes rare earth element powders, rare earth oxide powders, rare earth compound powders, rare earth nanoparticles and rare earth sputtering targets.

What are rare earth materials used for?

Rare earth materials are used in magnets, batteries, catalysts, phosphors, ceramics, polishing systems, optical components, electronic devices, thin films and advanced coatings.

Which rare earth oxide powders are commonly used?

Common rare earth oxide powders include cerium oxide, lanthanum oxide, neodymium oxide, yttrium oxide, dysprosium oxide, erbium oxide, europium oxide, gadolinium oxide, samarium oxide and terbium oxide.

Are rare earth sputtering targets used for thin-film deposition?

Yes. Rare earth sputtering targets are used in vacuum coating and thin-film deposition processes where controlled material composition and surface functionality are required.

What are Graphene Nanoplatelets?

Graphene nanoplatelets (GNPs) are nanoscale particles made of multiple stacked layers of graphene, typically a few nanometers thick with diameters ranging from submicron to several microns. They deliver much of graphene's performance, including high electrical and thermal conductivity and excellent mechanical strength, while remaining easier to produce and more cost-effective for large-scale use. Their platelet shape and high aspect ratio make them especially valuable as additives, as explained in our overview of graphene nanoplatelet properties and applications.

Properties of Graphene Nanoplatelets

  • High electrical conductivity for conductive composites and coatings
  • Excellent thermal conductivity for heat dissipation and thermal management
  • High mechanical strength and stiffness for reinforcement
  • Large surface area and high aspect ratio
  • Chemical stability and barrier properties
  • Cost-effective and scalable for industrial use

Applications of Graphene Nanoplatelets

Graphene nanoplatelets are used across a wide range of industries, thanks to their balance of performance and cost. They reinforce polymer and composite materials, improve electrical and thermal conductivity in coatings and inks, and enhance electrode performance in batteries and supercapacitors. Their conductive network also supports EMI shielding, anti-static coatings, and thermal interface materials, and you can explore some of the best application areas of graphene nanoplatelets in more detail. The electrical properties of GNPs make them a practical choice wherever conductivity and mechanical strength are needed together.

Graphene Nanoplatelets vs Graphene Oxide

Graphene nanoplatelets and graphene oxide serve different needs. GNPs are conductive, hydrophobic, and ideal for reinforcement and thermal or electrical enhancement, while graphene oxide is oxygen-rich, water-dispersible, and better suited to functionalization and membranes. Our comparison of GNPs versus graphene oxide for composites can help you choose the right material for your formulation.

Graphene Nanoplatelets Price and Market

The global graphene nanoplatelets market continues to grow rapidly, driven by demand from composites, coatings, energy storage, and automotive sectors. Graphene nanoplatelet price varies depending on surface area, thickness, purity, and order volume, from research-scale grams to bulk industrial quantities. As a trusted graphene nanoplatelets supplier, Nanografi offers transparent, competitive pricing across a range of grades, so you can source the right material for your budget and application. Check the product listings above for up-to-date prices and specifications.

Frequently Asked Questions

Where can I buy graphene nanoplatelets?

You can buy graphene nanoplatelets directly from Nanografi. We supply GNPs in various surface areas and thicknesses for both research and industrial use, with worldwide shipping.

How much do graphene nanoplatelets cost?

Graphene nanoplatelet price depends on surface area, thickness, purity, and order volume. Nanografi provides best-priced GNPs for both research and industrial quantities. See the product listings above for current pricing.

What is the difference between graphene nanoplatelets and graphene?

Graphene is a single atomic layer of carbon, while graphene nanoplatelets consist of multiple stacked graphene layers. GNPs are more cost-effective and easier to process at scale, making them ideal for composites and coatings.

What are graphene nanoplatelets used for?

Common applications include composite reinforcement, conductive coatings and inks, energy storage electrodes, EMI shielding, anti-static coatings, and thermal management.

Buy Graphene Nanoplatelets Today

Explore Nanografi's high-quality graphene nanoplatelets, engineered to meet global quality standards at competitive prices. As a leading supplier of graphene and graphene derivatives, we help you find the right grade for your research and production, so browse the products above and order today with worldwide shipping.