Lanthanum Nickel Oxide Sputtering Targets
The lanthanum nickel oxide theoretical prediction for superconductivity has triggered intensive research efforts. Lanthanum nickel oxide has the property of staying paramagnetic and metallic down to the lowest temperatures. This property is unique to lanthanum nickel oxide among other rare earth nickelates. The thin films of lanthanum nickel oxide are good materials used in supercapacitor, solid oxide fuel cell cathode, superconducting and catalyst. The purity of lanthanum nickel oxide that we provide is 99.9%. We take the highest care in the manufacturing of this material. It is produced with high purity metal oxide precursor materials, high energy mixing, powder synthesis, and particle processing processes. Apart from that, we use the proprietary process employed for sintering and pressing and multiple-step densification. We take great care in packaging our product for our customers. Special care is taken to avoid environmental contamination and protection is given during shipment.
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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST02LA18Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...NG0ST02LA17Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA16Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA15Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST02LA14Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA13Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA12Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA11Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA10Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA09Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA08Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA07Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA06Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA05Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST02LA04Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA03Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST02LA02Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA01Qty in Cart: 0Quantity:Price:Subtotal: