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Lanthanum Strontium Manganate (La0.9Sr0.1MnO3)

Lanthanum Strontium Manganate (La0.9Sr0.1MnO3)

We specialize in manufacturing lanthanum strontium manganate (La0.9Sr0.1MnO3) for the application of the cathode of the fuel cell. LSM has a crystal structure at 25°C with a crystallographic density of 6.4 g/cm3. The appearance of lanthanum strontium manganate is brown to black crystalline powder or ink and the melting point is greater than 300°C. LSM has very good thermal expansion and has a high conductivity of electricity. It has a single-phase perovskite structure and has long-term stability. Many Doping levels of Strontium are available according to the specifications of customers or at 10% & 20%. The composition of starved oxygen is also available. This is available as an ink for screen printing and as a spray or in powder form for tape casting. We provide targets from the ultra-high purification process with a purity of up to 99%. We provide complete guidance to our customers about the specifications and precautionary measures about the product

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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3)(indium) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA64
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA51
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA50
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA49
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA48
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA47
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