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Sputtering Targets

Sputtering Targets

As a leading supplier of high-quality nanomaterials and nanotechnology-based products, Nanografi offers a wide range of sputtering targets for various applications.

Sputtering targets are a physical vapor deposition mechanism that have a multitude of uses in modern manufacturing and technology. The process involves breaking solid materials into gaseous ions which coat other materials, creating a thin film. Sputtering can be scaled for large production batches or small research projects. With high productivity and versatility, the demand for sputtering targets has increased in recent years.

At Nanografi, we offer sputtering targets for applications such as glass coating, decorative coating, solar cell coating, and semiconductors. We also provide targets for strengthening the surfaces of molds and tools, including chromium, titanium, and aluminum.

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  • Lead Zirconium Titanate, PZT (O5PbTiZr) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

    $1,260.67
    1 piece/1070 €    Please contact us for quotes on larger quantities !!!  Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology...
    NG0ST01LE51
    $1,260.67
    Qty in Cart: 0
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    $1,260.67
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  • Lead Zirconium Titanate, PZT (O5PbTiZr) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

    $1,005.00
    1 piece/853 €    Please contact us for quotes on larger quantities !!!  Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology...
    NG0ST01LE50
    $1,005.00
    Qty in Cart: 0
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    $1,005.00
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  • Lead Zirconium Titanate, PZT (O5PbTiZr) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

    $1,096.90
    1 piece/931 €    Please contact us for quotes on larger quantities !!!  Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of...
    NG0ST01LE49
    $1,096.90
    Qty in Cart: 0
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    $1,096.90
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  • Lead Zirconium Titanate, PZT (O5PbTiZr) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

    $992.04
    1 piece/842 €    Please contact us for quotes on larger quantities !!!  Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of...
    NG0ST01LE48
    $992.04
    Qty in Cart: 0
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    $992.04
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  • Lead Zirconium Titanate, PZT (O5PbTiZr) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

    $983.80
    1 piece/835 €  Please contact us for quotes on larger quantities !!!  Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin...
    NG0ST01LE47
    $983.80
    Qty in Cart: 0
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    $983.80
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  • Lead Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.99+%

    Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 4'', Thickness: 0.250''

    $407.66
    1 piece/346 €    Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.99+%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films...
    NG0ST01LE09
    $407.66
    Qty in Cart: 0
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    $407.66
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  • Lead Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.99+%

    Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 4'', Thickness: 0.125''

    $354.64
    1 piece/301 €    Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.99+%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from...
    NG0ST01LE08
    $354.64
    Qty in Cart: 0
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    $354.64
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  • Lead Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.99+%

    Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 3'', Thickness: 0.250''

    $389.98
    1 piece/331 €    Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.99+%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films...
    NG0ST01LE07
    $389.98
    Qty in Cart: 0
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    $389.98
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  • Lead Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.99+%

    Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 3'', Thickness: 0.125''

    $339.32
    1 piece/288 €    Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.99+%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from...
    NG0ST01LE06
    $339.32
    Qty in Cart: 0
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    Price:
    $339.32
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  • Lead Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.99+%

    Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 2'', Thickness: 0.250''

    $172.02
    1 piece/146 €   Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.99+%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a...
    NG0ST01LE05
    $172.02
    Qty in Cart: 0
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    Price:
    $172.02
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  • Lead Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.99+%

    Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 2'', Thickness: 0.125''

    $187.33
    1 piece/159 €  Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.99+%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide...
    NG0ST01LE04
    $187.33
    Qty in Cart: 0
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    Price:
    $187.33
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  • Lead Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.99+%

    Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 1'', Thickness: 0.250''

    $163.77
    1 piece/139 €    Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.99+%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films...
    NG0ST01LE03
    $163.77
    Qty in Cart: 0
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    Price:
    $163.77
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  • Lead Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.99+%

    Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 1'', Thickness: 0.125''

    $128.42
    1 piece/109 €  Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.99+%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide...
    NG0ST01LE02
    $128.42
    Qty in Cart: 0
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    Price:
    $128.42
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  • Lead Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.999%

    Lead (Pb) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.125''

    $100.15
    1 piece/85 €    Please contact us for quotes on larger quantities !!!  Lead (Pb) Sputtering Targets Purity: 99.999%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films...
    NG0ST01LE01
    $100.15
    Qty in Cart: 0
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    Price:
    $100.15
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA80
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA79
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:7'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA78
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:7'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA77
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:6'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA76
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:6'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA75
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:5'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA74
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:5'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA73
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA72
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA71
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA70
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA69
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA68
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA67
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA66
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA65
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3)(indium) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA64
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA51
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA50
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA49
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA48
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA47
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3)(indium) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse...
    NG0ST02LA46
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA37
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA36
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.9%

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA35
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