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Sputtering Targets Names D - M

Sputtering Targets Names D - M

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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA68
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%
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    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA67
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%
    Quick view

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA66
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  • Lanthanum Titanate (LaTiO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Titanate (LaTiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA65
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3)(indium) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%
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    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, indium Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA64
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA51
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA50
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA49
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA48
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  • Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA47
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3)(indium) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%
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    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse...
    NG0ST02LA46
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA37
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA36
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA35
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA34
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA33
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA32
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA31
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  • Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA30
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  • Lanthanum Nickel Oxide (indium)(LaNiO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%
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    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...
    NG0ST02LA18
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  • Lanthanum Nickel Oxide (indium)(LaNiO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%
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    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...
    NG0ST02LA17
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA16
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA15
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:7'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA14
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:7'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA13
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:6'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA12
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:6'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA11
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:5'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA10
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:5'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA09
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:4'' ,Thickness:0.250'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA08
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:4'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA07
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:3'' ,Thickness:0.250'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA06
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA05
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA04
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:2'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA03
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:1'' ,Thickness:0.250'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST02LA02
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  • Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Size:1'' ,Thickness:0.125'' , Purity: 99.9%
    Quick view

    Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

      Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...
    NG0ST02LA01
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  • Lanthanum Manganate (LaMnO3) Sputtering Targets, Size:8'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

      Lanthanum Manganate (LaMnO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01LA00
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  • Lanthanum Manganate (LaMnO3) Sputtering Targets, Size:8'' ,Thickness:0.125'' , Purity: 99.9%
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    Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

      Lanthanum Manganate (LaMnO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.125''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01LA99
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  • Lanthanum Manganate (LaMnO3) Sputtering Targets, Size:7'' ,Thickness:0.250'' , Purity: 99.9%
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    Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''

      Lanthanum Manganate (LaMnO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.250''  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...
    NG0ST01LA98
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