Lanthanum Nickel Oxide Sputtering Targets
Lanthanum nickel oxide is a chemical compound that has been used in various applications. This chemical compound is known as a good electric conductor. The applications of lanthanum nickel oxide have a good thermal and chemical stability hence it is used for ferroelectric thin-film capacitors, solid oxide fuel cells, and multilayer actuators. Lanthanum nickel oxide sputtering targets also great for removing oxygen particles to prevent corrosion or wear. It is also a good property for catalyst precursors. Lanthanum nickel oxide sputtering targets also has perovskite oxide property which is potential for catalytic application both high-temperature gas, solid, and liquid at low temperature. A thin layer of a protective coat of lanthanum nickel oxide can be obtained through physical vapor deposition or chemical vapor deposition.
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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate...NG0ST02LA18Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and...NG0ST02LA17Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA16Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 8'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA15Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST02LA14Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 7'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA13Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA12Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 6'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA11Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA10Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 5'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA09Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA08Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 4'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA07Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA06Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA05Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST02LA04Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 2'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA03Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.250'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.The...NG0ST02LA02Qty in Cart: 0Quantity:Price:Subtotal: -
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes...NG0ST02LA01Qty in Cart: 0Quantity:Price:Subtotal: