Niobium Sputtering Targets

These targets have an appearance of silvery color with a melting point of 2468 °C and a boiling point of 4742 °C. Our thin film sputtering targets are available monoblock or bonded with configurations up to 8 mm with drilling hole locations. We produced these targets with the highest possible density of 8.57 g/cm3. Niobium sputtering target has an electrical resistivity of 12.5 microhm-cm @ 0°C and Electronegativity of 1.6 Paulings. These targets have a specific heat of 0.064 Cal/g/K @ 25°C and thermal conductivity of 0.537 W/cm/K @ 298.2 K. We manufacture these targets in various shapes and sizes. We take special care when an order of custom shape or size is requested. Niobium sputtering targets have 7.3 µm/(m•K) thermal expansion and Vickers hardness is 1320 MPa. We provide the smallest possible average grain size of niobium sputtering targets with a molecular weight of 92.9 g/mol. These targets have young’s modulus of 105 GPa with guaranteed purity.